As a key player in Sweden’s high-power impulse magnetron sputtering (HiPIMS) technology sector, Ionautics has long focused on the research and development of advanced coating equipment and process innovation. With its reliable technical solutions, the company provides professional equipment support to the global surface engineering and PVD (physical vapor deposition) industry, earning a strong reputation in the industrial application of high-precision coating technologies.
Recently, Ionautics announced another significant milestone—its self-developed next-generation HiPIMS device, HiPSTER 25, has completed full installation and commissioning at Swiss PVD, a renowned Swiss enterprise in the high-end coating sector, and has successfully commenced its first commercial operation. This achievement not only reflects the deep technical and practical collaboration between the two parties in the field of high-performance thin-film deposition but also marks the successful deployment of the HiPSTER series’ core technology in the European high-end PVD market. It opens up new avenues for enhancing coating efficiency, optimizing process precision, and expanding high-end application scenarios.
Deployed at Swiss PVD, Building a High-End Coating Ecosystem Together
Swiss PVD is a Swiss enterprise with extensive experience in advanced surface engineering technologies, operating across multiple domains such as hard coatings, functional thin films, and optical applications. With its rich expertise in thin-film deposition and a refined process control system, Swiss PVD places stringent requirements on equipment stability, repeatability, and process consistency.
The integration of HiPSTER 25 into Swiss PVD’s production system provides the company with a new technological option for expanding efficient HiPIMS processes and creates opportunities for deeper collaboration and joint exploration of high-performance thin-film deposition solutions. For Ionautics, the successful deployment of HiPSTER 25 at Swiss PVD represents another validation in a high-end application scenario. This move is expected to yield more industrial-level feedback, further driving product iteration and performance optimization.
